2006 Fotona Dualis XS Erbium Yag Laser - Rock Bottom Lasers

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2006 Fotona Dualis XS Erbium Yag Laser

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2006 Fotona Dualis XS Erbium Yag 2940 nm Resurfacing Laser, Model M002-2A; Excellent Cosmetic and Operating Condition, One Owner; Total Pulse Count: 1,003,500; Includes: (1) R04-F Handpiece, (1) R11 Handpiece, (1) Footswitch, (2) Keys, (2) Operator Manuals, and 90 Day Warranty

$13,975.00

Out of stock

Laser Type:Erbium Yag
Wavelength:2940 nm
Max. Pulse Energy:3000 mJ
Max. Average Power:20 W
Pulsewidth:VSP (100 ìs), SP (300 ìs), LP (600 ìs), XLP (1500 ìs)
Max. Frequency:20 Hz
Spotsizes:0.5 to 12 mm
Beam Delivery Type:7-Mirror Articulated Arm
Compatible Handpieces:
R04-F:Dermatological, straight handpiece, with 5 different spacers for 3, 5, 7, 10 and 12 mm spot sizes. Recommended for skin resurfacing, removal of skin lesions and scars.
R08:Surgical, straight handpiece, 0.45 mm spot size at the distance indicated by spacer. Recommended for cutting in skin and mucosa. Special spacer available for hair transplant procedures.
R09-2:Multi-functional, collimated straight handpiece, 4 mm spot size for a 2 to 10 cm distance from the target. Recommended for skin resurfacing and removal of leukoplakia.
R09-3:Muliti-funtional, collimated straight handpiece, 5 mm spot size for a 2 to 10 cm distance from the target. Recommended for skin resurfacing and removal of leukoplakia.
R09-2G:Multi-functional, collimated straight handpiece with a tube for gynaecology. Recommended for the removal of genital warts.
R11:Dermatological, straight collimated handpiece with variable spot sizes from 2 to 7 mm. Recommended for skin resurfacing and removal of skin lesions and scars.

Fotona Dualis XS – Er:YAG Resurfacing Laser

The Fotona Dualis XS is an advanced, high-performance Er:YAG laser system for surgery and skin resurfacing in dermatology and aesthetic medicine. It is your perfect choice for fast and efficient treatments with superior clinical results.

Treatments:

Pigmented Lesion Treatments
Fine Lines and Wrinkles
Laser Peels
Hypertrofic and Acne Scarring

Features:

Fast and More Efficient Procedures with the Largest Spotsizes
Unmatched Treatment Options to Suit Your Patients’ Expectations
User-Friendly Technology for Superior Ease-of-Use
Fast and More Efficient Procedures with the Largest Spotsizes
The DualisXS superior power-generating capacity provides its Er:YAG laser all the energy needed for faster and more effective laser treatments. Its unmatched energy output ensures that spotsizes of up to 12 mm remain effective making treatments of larger areas (such as face, neck and chest) both highly efficient and less tiring.

Unmatched Treatment Options to Suit Your Patients’ Expectations

The DualisXS treatment modalities range from providing cold ablative resurfacing to deep thermal effects. Its Er:YAG laser can gently ablate the epidermis micron layer-by-layer to smooth-out skin without thermally affecting surrounding tissues, or can provide controlled deep thermal effects. This treatment flexibility makes treating problematic acne scarring easier and more effective. The DualisXS is so powerful that it removes all common superficial lesions in the minimum of time. Patients’ expectations can be met through an unlimited range of gentle treatment options that also provide superior clinical results.

User-Friendly Technology for Superior Ease-of-Use

Fotona’s Variable Square Pulse technology automatically matches the laser pulse duration and energy levels, at the touch of a button, to specific treatment goals. VSP provides higher treatment predictability, unmatched efficiency and ensures patient safety and comfort. Energy Feedback Control technology automatically calibrates the laser output and checks each laser pulse allowing you to be confident in the technology and eliminating the need for periodical, manual calibrations.

Date Sold

* Shipping is included in the Continental USA only. Any shipment outside the lower 48 United States will be shipped at an extra cost. If you live outside this area, please contact us for a free shipping estimate.

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